Electron Beam Lithography

Multi Technique Electron Beam Lithography
Raith nanofabrication, eLINE Plus

eLINE Plus combines an Electron Beam Lithography system with an open platform for further optional nanofabrication processes and techniques in a single tool.


Main instrumental features:

  • Advanced TFE electron column offering the world´s smallest beam size
  • Resolution <5nm
  • Open and upgradable platform concept
  • Wide range of nanofabrication processes
  • Inlense SE detector
  • Unique stitch-error-free writing modes, traxx and periodixx
  • Raith NanoSuite: comprehensive software interface with all modules fully integrated