Mask Aligner

The mask aligner MJB4 is equipped with a 365nm wavelength light from a mercury lamp for the exposure illumination. The aligner performs exposures in vacuum (vacuum between substrate and mask), low vacuum (vacuum level between substrate and mask can be adjusted), hard (nitrogen pressure under the substrate), soft (vacuum under the substrate) contacts. Line space resolution up to 0.8 micron can be achieved under optimum conditions in the vacuum mode, up to 1 micron for hard contact and up to 2 microns for soft contact.
The size of substrates are ranging from small samples to 3 or 4 in wafers.